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https://hdl.handle.net/10316/4290| Title: | Nanocrystalline structure and hardness of thin films | Authors: | Cavaleiro, A. Louro, C. |
Keywords: | W-Si-N coatings; Hardness; Nanostructure; Sputtering | Issue Date: | 2002 | Citation: | Vacuum. 64:3-4 (2002) 211-218 | Abstract: | W---Si---N films were deposited by reactive sputtering in a N2+Ar atmosphere from a W target incrusted with different number of Si pieces. The coatings present different crystallographic structures from the crystalline [alpha]-W and W2N to amorphous phase. Crystalline films have very low grain sizes from 15 down to 3 nm. | URI: | https://hdl.handle.net/10316/4290 | DOI: | 10.1016/S0042-207X(01)00337-2 | Rights: | openAccess |
| Appears in Collections: | FCTUC Eng.Mecânica - Artigos em Revistas Internacionais |
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| filebba10f2696e2447195cab3b8380f077d.pdf | 176.01 kB | Adobe PDF | View/Open |
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